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Effects of Gd Doping and Oxygen Vacancies on the Properties of EuO Films Prepared via Pulsed Laser Deposition

机译:Gd掺杂和氧空位对EuO薄膜性能的影响 通过脉冲激光沉积制备

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摘要

We have successfully prepared EuO films on Si(100) wafers via pulsed laser deposition (PLD). It is well recognized that EuO grows with texture growth along (100) but the addition of 4% Gd changes the lattice constant and the texture growth to (111) as well as having a profound influence on the magnetic properties. The differences in the effects between Gd doping and oxygen vacancies, both expected to be n-type (donor state) dopants in EuO, are discussed.
机译:我们已经通过脉冲激光沉积(PLD)在Si(100)晶片上成功制备了EuO膜。众所周知,EuO随(100)的织构增长而增长,但是添加4%Gd会改变晶格常数和(111)的织构增长,并对磁性能产生深远的影响。讨论了在EuO中Gd掺杂和氧空位的影响之间的差异,二者均预期为n型(施主态)掺杂剂。

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